Nio Sputtering Materials for Thin Film Deposition and High Purity Ceramic TargetNio Sputtering Materials for Thin Film Deposition and High Purity Ceramic TargetNio Sputtering Materials for Thin Film Deposition and High Purity Ceramic TargetNio Sputtering Materials for Thin Film Deposition and High Purity Ceramic Target
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$25~29.92
Other Devices · Basic Manufacturing Equipment · Welding Equipment

Nio Sputtering Materials for Thin Film Deposition and High Purity Ceramic Target

Released on2024年09月19 04:51
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Changsha Xinkang Advanced Materials Co., Ltd.
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Attributes
Model NO.XK-NiO 01
Packaging1PC Vacuum Forming
SizeCustomized
Delivery7-15days
CertificateISO9001:2015
MOQ1PC
Transport PackageVacuum Inside, Carton or Wooden Case Outside
SpecificationD50.8mm D101.6mm support
TrademarkNo
OriginChina
Production Capacity10000PCS/Month
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